PHI 5000 Versa Probe II

LEEP 2 Room G442

Features

• Scanned, micro-focused, monochromatic x-ray beam
• Floating column argon ion gun
• 20 kV electron gun
• LaB6 emitter creates a raster-scanned electron beam focused on the Al anode of the x-ray source to produce a monochromated x-rays
• Ellipsoidal shaped quartz crystal monochromator collects, filters, and refocuses x-rays onto the sample surface to scan and acquire the spectrum.
• Dual-beam charge neutralization
• Compucentric Zalar rotation
• Sputter depth profiling (5V to 5000)
• Angle-resolved spectroscopy
• Chemical state imaging with 128 data channels
• Elemental composition and chemical mapping with SXI (Secondary X-ray Imaging) and Scanning Electron Microscopy (SEM; using secondary electrons)
• Five-axis automated sample manipulator
• 25 mm and 60 mm diameter sample holders
• Extra Sample Prep chamber with Heating, Cooling, and mixture of Gases 
• X-ray beam size for XPS ranges from 9µ to 200µ and AES is scanned at 100nm
• The instrument is driven by SmartSoft software data are acquired by Multipak Software tools developed by Physical Electronics

Workstation Specifications 

  Work Station

• Xeon E5-1603
• 4GB RAM
• NVIDIA Quadro 410 graphics card
• two-512GB SATA HDD RAID
• Windows 7 32 bit.

Please contact Dr. Prem S. Thapa Chetri (Senior Electron Microscopist) or Dr. Eduardo Rosa-Molinar (Director/Professor) if you need further details.