PHI 5000 Versa Probe II
LEEP 2 Room G442
Features
- Scanned, micro-focused, monochromatic x-ray beam
- Floating column argon ion gun
- 20 kV electron gun
- LaB6 emitter creates a raster-scanned electron beam focused on the Al anode of the x-ray source to produce a monochromated x-rays
- Ellipsoidal shaped quartz crystal monochromator collects, filters, and refocuses x-rays onto the sample surface to scan and acquire the spectrum.
- Dual-beam charge neutralization
- Compucentric Zalar rotation
- Sputter depth profiling (5V to 5000)
- Angle-resolved spectroscopy
- Chemical state imaging with 128 data channels
- Elemental composition and chemical mapping with SXI (Secondary X-ray Imaging) and Scanning Electron Microscopy (SEM; using secondary electrons)
- Five-axis automated sample manipulator
- 25 mm and 60 mm diameter sample holders
- Extra Sample Prep chamber with Heating, Cooling, and mixture of Gases
- X-ray beam size for XPS ranges from 9µ to 200µ and AES is scanned at 100nm
- The instrument is driven by SmartSoft software data are acquired by Multipak Software tools developed by Physical Electronics
Workstation Specifications
Work Station
- Xeon E5-1603
- 4GB RAM
- NVIDIA Quadro 410 graphics card
- two-512GB SATA HDD RAID
- Windows 7 32 bit.
Please contact Dr. Prem S. Thapa Chetri (Senior Electron Microscopist) or Dr. Eduardo Rosa-Molinar (Director/Professor) if you need further details.
